The U-eLektron Ebeam system was designed to provide a research and development oriented solution to labs of any size. As a bench top tool, the U-eLektron can provide immediate results without the cost or time required for external testing.
Unique USHIO Ebeam sources provide electron beams with potentials of 10-50 keV. These units are compact, self-shielding, and have their own exposure chamber.
These systems are modular, user friendly and designed for ease of maintenance.
- Custom built systems are available
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U-eLektron Exposure Results
|
Feature |
 |
Benefit |
| Low voltage
electrons |
|
- Allows
maximum transfer of energy into the surface
of the exposed material
- Optimizes reactions in this 10-50 micron
depth.
Minimizes effects on or damage to the
substrate below this depth |
| Compact, self-shielding
unit |
|
Supports
selected reactions with specificity not
available from higher power sources |
|
SPECIFICATION |
|
U-eLektron |
| Accelerated
voltage |
|
10-50 keV |
| Amperage |
|
0-200 μAmps |
| X-ray generation |
|
Low |
| Ozone generation |
|
Low |
| System size |
|
Lab scale
systems |
| Vacuum equipment |
|
Required |
| Warm-up interval |
|
None |
|
